Invention Application
- Patent Title: PROCESS AND APPARATUS FOR ULTRAVIOLET NANO-IMPRINT LITHOGRAPHY
- Patent Title (中): 用于超紫外线纳米切片的方法和装置
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Application No.: US13298404Application Date: 2011-11-17
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Publication No.: US20120056355A1Publication Date: 2012-03-08
- Inventor: Eun-Hyoung CHO , Sung Hoon CHOA , Jin Seung SOHN , Byung Kyu LEE , Du Hyun LEE
- Applicant: Eun-Hyoung CHO , Sung Hoon CHOA , Jin Seung SOHN , Byung Kyu LEE , Du Hyun LEE
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2007-0014390 20070212
- Main IPC: B29C59/16
- IPC: B29C59/16
Abstract:
A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.
Public/Granted literature
- US08562891B2 Process and apparatus for ultraviolet nano-imprint lithography Public/Granted day:2013-10-22
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