Invention Application
- Patent Title: SUPPLY OF A LIQUID-METAL TARGET IN X-RAY GENERATION
- Patent Title (中): 在X射线发生中液体金属目标的供应
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Application No.: US13262499Application Date: 2009-04-03
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Publication No.: US20120057680A1Publication Date: 2012-03-08
- Inventor: Oscar Hemberg , Tomi Tuohimaa , Mikael Otendal
- Applicant: Oscar Hemberg , Tomi Tuohimaa , Mikael Otendal
- Applicant Address: SE Kista
- Assignee: EXCILLUM AB
- Current Assignee: EXCILLUM AB
- Current Assignee Address: SE Kista
- International Application: PCT/EP09/02464 WO 20090403
- Main IPC: H01J35/02
- IPC: H01J35/02

Abstract:
Closed-loop circulation for providing liquid metal to an interaction region at which an electron beam is to impact upon the liquid metal to produce X-rays is presented. In a method according to the invention, the pressure of the liquid metal is raised to at least 10 bar using a high-pressure pump. The pressurized liquid metal is then conducted to a nozzle and ejected into a vacuum chamber in the form of a spatially continuous jet. After passage through the vacuum chamber, the liquid metal is collected in a collection reservoir, and the pressure of the liquid metal is raised to an inlet pressure, e.g. using a primer pump, suitable for the inlet of the high-pressure pump. The invention also relates to a corresponding circulation system and an X-ray source provided with such circulation system.
Public/Granted literature
- US08837679B2 Supply of a liquid-metal target in X-ray generation Public/Granted day:2014-09-16
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