发明申请
US20120058323A1 Control of Strain Through Thickness in Epitaxial Films Via Vertical Nanocomposite Heteroepitaxy
审中-公开
通过垂直纳米复合材料异质外延控制外延薄膜中的厚度
- 专利标题： Control of Strain Through Thickness in Epitaxial Films Via Vertical Nanocomposite Heteroepitaxy
- 专利标题（中）： 通过垂直纳米复合材料异质外延控制外延薄膜中的厚度
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申请号： US12671891申请日： 2008-08-01
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公开(公告)号： US20120058323A1公开(公告)日： 2012-03-08
- 发明人: Judith L. Driscoll , Quanxi Jia , Patrick Zerrer
- 申请人： Judith L. Driscoll , Quanxi Jia , Patrick Zerrer
- 申请人地址： US NM Los Alamos
- 专利权人： LOS ALAMOS NATIONAL SECURITY, LLC
- 当前专利权人： LOS ALAMOS NATIONAL SECURITY, LLC
- 当前专利权人地址： US NM Los Alamos
- 国际申请： PCT/US08/09337 WO 20080801
- 主分类号： B32B15/00
- IPC分类号： B32B15/00
摘要：
A two-dimensional vertical heteroepitaxial strain controlled composite is grown. The strain-controlling phase can be benign in all other respects so that the functional properties of the parent phase are unchanged, improved/enhanced, and/or manipulated. The new composite is advantageous because there is no need for expensive specialized crystals and because there are no thickness limitations.
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