Invention Application
- Patent Title: FRONT REFERENCED ANODE
- Patent Title (中): 前参考阳极
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Application No.: US12879484Application Date: 2010-09-10
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Publication No.: US20120061246A1Publication Date: 2012-03-15
- Inventor: Jingbin Feng , R. Marshall Stowell , Shantinath Ghongadi , Zhian He , Frederick Dean Wilmot
- Applicant: Jingbin Feng , R. Marshall Stowell , Shantinath Ghongadi , Zhian He , Frederick Dean Wilmot
- Main IPC: C25D7/12
- IPC: C25D7/12 ; C25D17/06 ; C25D17/10 ; C25D17/00
Abstract:
Apparatus and methods for electroplating are described. Apparatus described herein include anode supports including positioning mechanisms that maintain a consistent distance between the surface of the wafer and the surface of a consumable anode during plating. Greater uniformity control is achieved.
Public/Granted literature
- US09028657B2 Front referenced anode Public/Granted day:2015-05-12
Information query
