Invention Application
- Patent Title: ELECTRICAL MASK INSPECTION
- Patent Title (中): 电磁屏蔽检查
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Application No.: US12886612Application Date: 2010-09-21
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Publication No.: US20120068174A1Publication Date: 2012-03-22
- Inventor: Arvind Kumar , Anthony I-Chih Chou , Shreesh Narasimha
- Applicant: Arvind Kumar , Anthony I-Chih Chou , Shreesh Narasimha
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L21/66 ; H01L21/768
Abstract:
An apparatus and method for electrical mask inspection is disclosed. A scan chain is formed amongst two metal layers and a via layer. One of the three layers is a functional layer under test, and the other two layers are test layers. A resistance measurement of the scan chain is used to determine if a potential defect exists within one of the vias or metal segments comprising the scan chain.
Public/Granted literature
- US08343781B2 Electrical mask inspection Public/Granted day:2013-01-01
Information query
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