发明申请
- 专利标题： METHOD FOR FORMING ELECTRODE STRUCTURE
- 专利标题（中）： 形成电极结构的方法
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申请号： US13105405申请日： 2011-05-11
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公开(公告)号： US20120070984A1公开(公告)日： 2012-03-22
- 发明人: Wen-Chung Tang , Yao Peng , Chia-Chun Yeh , Yao-Chou Tsai
- 申请人： Wen-Chung Tang , Yao Peng , Chia-Chun Yeh , Yao-Chou Tsai
- 申请人地址： TW Hsinchu City
- 专利权人： E Ink Holdings Inc.
- 当前专利权人： E Ink Holdings Inc.
- 当前专利权人地址： TW Hsinchu City
- 优先权： TW099131823 20100920; TW099134631 20101011
- 主分类号： H01L21/283
- IPC分类号： H01L21/283
摘要：
In a method for forming an electrode structure in a display device, e.g. a source, drain or gate electrode or a pixel electrode, a photoactive conductive layer, which includes conductive material containing photoactive material, is formed above a substrate of the display device. The photoactive conductive layer is then patterned with a photo-mask and partially removed without the presence of a photo-resist to form the electrode structure.
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