发明申请
- 专利标题: MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL
- 专利标题(中): 碳化硅单晶的制造方法
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申请号: US13245934申请日: 2011-09-27
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公开(公告)号: US20120073495A1公开(公告)日: 2012-03-29
- 发明人: Yasushi URAKAMI , Ayumu Adachi , Itaru Gunjishima
- 申请人: Yasushi URAKAMI , Ayumu Adachi , Itaru Gunjishima
- 申请人地址: JP Kariya-city
- 专利权人: DENSO CORPORATION
- 当前专利权人: DENSO CORPORATION
- 当前专利权人地址: JP Kariya-city
- 优先权: JP2010-219348 20100929
- 主分类号: C30B23/02
- IPC分类号: C30B23/02
摘要:
In a manufacturing method of a silicon carbide single crystal, a seed crystal made of silicon carbide is prepared. The seed crystal has a growth surface and a stacking fault generation region and includes a threading dislocation that reaches the growth surface. The growth surface is inclined at a predetermined angle from a (0001) plane. The stacking fault generation region is configured to cause a stacking fault in the silicon carbide single crystal when the silicon carbide single crystal is grown. The stacking fault generation region is located at an end portion of the growth surface in an offset direction that is a direction of a vector defined by projecting a normal vector of the (0001) plane onto the growth surface. The seed crystal is joined to a pedestal, and the silicon carbide single crystal is grown on the growth surface of the seed crystal.
公开/授权文献
- US09145622B2 Manufacturing method of silicon carbide single crystal 公开/授权日:2015-09-29
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