Invention Application
US20120078561A1 Method for Calibrating a Target Surface of a Position Measurement System, Position Measurement System, and Lithographic Apparatus
审中-公开
用于校准位置测量系统，位置测量系统和平版印刷设备的目标表面的方法
- Patent Title: Method for Calibrating a Target Surface of a Position Measurement System, Position Measurement System, and Lithographic Apparatus
- Patent Title (中): 用于校准位置测量系统，位置测量系统和平版印刷设备的目标表面的方法
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Application No.: US13215620Application Date: 2011-08-23
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Publication No.: US20120078561A1Publication Date: 2012-03-29
- Inventor: Paulus Johannes KNIJN , Christiaan Alexander HOOGENDAM , Leon Martin LEVASIER , Roland BLOK , Martinus Agnes Willem CUIJPERS , Martin Frans Pierre SMEETS
- Applicant: Paulus Johannes KNIJN , Christiaan Alexander HOOGENDAM , Leon Martin LEVASIER , Roland BLOK , Martinus Agnes Willem CUIJPERS , Martin Frans Pierre SMEETS
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G06F19/00
- IPC: G06F19/00 ; G06F15/00
Abstract:
A method is used to calibrate a target surface of a position measurement system configured to measure a position of a movable object. The position measurement system includes the target surface mounted on the movable object, a stationary sensor system, and a processing device to calculate a position of the movable object on the basis of at least one measurement signal of the sensor system. The processing device includes a correction map of the target surface to correct for irregularities of the target surface. The method includes recalibrating the correction map of the target surface by measuring the target surface and determining a recalibrated correction map of the complete target surface on the basis of the measured target surface and one or more deformation modes of the target surface and/or physical objects affecting the target surface.
Information query
