发明申请
US20120082939A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
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活性光敏敏感性或放射性敏感性敏感性树脂组合物和主动光敏敏感或放射性敏感性膜和使用其的图案形成方法
- 专利标题： ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
- 专利标题（中）： 活性光敏敏感性或放射性敏感性敏感性树脂组合物和主动光敏敏感或放射性敏感性膜和使用其的图案形成方法
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申请号： US13252657申请日： 2011-10-04
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公开(公告)号： US20120082939A1公开(公告)日： 2012-04-05
- 发明人: Takeshi KAWABATA , Hidenori Takahashi , Tomotaka Tsuchimura , Shuji Hirano , Hideaki Tsubaki
- 申请人： Takeshi KAWABATA , Hidenori Takahashi , Tomotaka Tsuchimura , Shuji Hirano , Hideaki Tsubaki
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-225993 20101005
- 主分类号： G03F7/30
- IPC分类号： G03F7/30 ; C08F228/02 ; H01L21/02 ; C08F220/38
摘要：
An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided.The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.
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