发明申请
- 专利标题： IN-SITU VHF VOLTAGE/CURRENT SENSORS FOR A PLASMA REACTOR
- 专利标题（中）： 用于等离子体反应器的现场甚高频电压/电流传感器
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申请号： US13052280申请日： 2011-03-21
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公开(公告)号： US20120086464A1公开(公告)日： 2012-04-12
- 发明人: Hiroji Hanawa , Satoru Kobayashi , Kartik Ramaswamy , Shahid Rauf
- 申请人： Hiroji Hanawa , Satoru Kobayashi , Kartik Ramaswamy , Shahid Rauf
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： G01R27/04
- IPC分类号： G01R27/04
摘要：
An RE voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement. An RF current probe is encapsulated in a conductive housing to permit its placement inside a plasma reactor chamber.
公开/授权文献
- US08513939B2 In-situ VHF voltage sensor for a plasma reactor 公开/授权日：2013-08-20