发明申请
- 专利标题: DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER
- 专利标题(中): 用于物理蒸气沉积室的沉积环和静电吸盘
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申请号: US13280771申请日: 2011-10-25
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公开(公告)号: US20120103257A1公开(公告)日: 2012-05-03
- 发明人: Muhammad Rasheed , Keith A. Miller , Rongjun Wang
- 申请人: Muhammad Rasheed , Keith A. Miller , Rongjun Wang
- 申请人地址: US CA Santa Clara
- 专利权人: APPLIED MATERIALS, INC.
- 当前专利权人: APPLIED MATERIALS, INC.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: C23C16/458
- IPC分类号: C23C16/458 ; C23C16/04 ; C23C16/44
摘要:
Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal assembly. The components of the process kit work alone, and in combination, to significantly reduce their effects on the electric fields around a substrate during processing.
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