Invention Application
- Patent Title: THROUGH WIRING SUBSTRATE AND MANUFACTURING METHOD THEREOF
- Patent Title (中): 通过接线基板及其制造方法
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Application No.: US13345352Application Date: 2012-01-06
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Publication No.: US20120103677A1Publication Date: 2012-05-03
- Inventor: Satoshi YAMAMOTO , Hirokazu HASHIMOTO
- Applicant: Satoshi YAMAMOTO , Hirokazu HASHIMOTO
- Applicant Address: JP Tokyo
- Assignee: FUJIKURA LTD.
- Current Assignee: FUJIKURA LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2009-164001 20090710
- Main IPC: H05K1/11
- IPC: H05K1/11 ; B05D3/06 ; H05K3/00

Abstract:
A through wiring substrate includes a substrate including a first face and a second face, and a plurality of through-wires formed by filling, or forming a film of, an electrically-conductive substance in through-holes that penetrate between the first face and the second face. The through-wires are separated from each other, and, include at least one overlap section in a plan view of the substrate.
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