发明申请
- 专利标题: THROUGH WIRING SUBSTRATE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 通过接线基板及其制造方法
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申请号: US13344091申请日: 2012-01-05
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公开(公告)号: US20120103679A1公开(公告)日: 2012-05-03
- 发明人: Satoshi YAMAMOTO , Hirokazu HASHIMOTO
- 申请人: Satoshi YAMAMOTO , Hirokazu HASHIMOTO
- 申请人地址: JP Tokyo
- 专利权人: FUJIKURA LTD.
- 当前专利权人: FUJIKURA LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-159869 20090706
- 主分类号: H05K1/11
- IPC分类号: H05K1/11 ; H05K3/00
摘要:
A through wiring substrate includes a substrate having a first face and a second face; and a through-wire formed by filling, or forming a film of, an electrically-conductive substance into a through-hole, which penetrates between the first face and the second face. The through-hole has a bend part comprising an inner peripheral part that is curved in a recessed shape and an outer peripheral part that is curved in a protruding shape, in a longitudinal cross-section of the through-hole, and at least the inner peripheral part is formed in a circular arc shape in the longitudinal cross-section.
公开/授权文献
- US08785791B2 Through wiring substrate and manufacturing method thereof 公开/授权日:2014-07-22