发明申请
- 专利标题： MICROMIRROR UNIT AND METHOD OF MAKING THE SAME
- 专利标题（中）： 微机单元及其制造方法
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申请号： US13336190申请日： 2011-12-23
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公开(公告)号： US20120105936A1公开(公告)日： 2012-05-03
- 发明人: Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
- 申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
- 申请人地址： JP Kawasaki-shi
- 专利权人： FUJITSU LIMITED
- 当前专利权人： FUJITSU LIMITED
- 当前专利权人地址： JP Kawasaki-shi
- 优先权： JP2001-129596 20010426
- 主分类号： G02B26/00
- IPC分类号： G02B26/00
摘要：
A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
公开/授权文献
- US08693083B2 Micromirror unit and method of making the same 公开/授权日：2014-04-08