Invention Application
- Patent Title: APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Patent Title (中): 用于控制粒子束制造的装置和方法
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Application No.: US13354938Application Date: 2012-01-20
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Publication No.: US20120112323A1Publication Date: 2012-05-10
- Inventor: Michael John Zani , Mark Joseph Bennahmias , Mark Anthony Mayse , Jeffrey Winfield Scott
- Applicant: Michael John Zani , Mark Joseph Bennahmias , Mark Anthony Mayse , Jeffrey Winfield Scott
- Applicant Address: US CA Laguna Niguel
- Assignee: NEXGEN SEMI HOLDING, INC.
- Current Assignee: NEXGEN SEMI HOLDING, INC.
- Current Assignee Address: US CA Laguna Niguel
- Main IPC: H01L21/265
- IPC: H01L21/265 ; H01L29/06

Abstract:
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
Public/Granted literature
- US08658994B2 Apparatus and method for controlled particle beam manufacturing Public/Granted day:2014-02-25
Information query
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