发明申请
- 专利标题: SUBSTRATE TREATMENT APPARATUS, METHOD OF TRANSFERRING SUBSTRATE, AND NON-TRANSITORY COMPUTER STORAGE MEDIUM
- 专利标题(中): 基板处理装置,基板转印方法和非电子计算机存储介质
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申请号: US13281535申请日: 2011-10-26
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公开(公告)号: US20120116567A1公开(公告)日: 2012-05-10
- 发明人: Makoto HAYAKAWA , Hiroshi Tomita , Tatsuhei Yoshida
- 申请人: Makoto HAYAKAWA , Hiroshi Tomita , Tatsuhei Yoshida
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-250909 20101109
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
A coating and developing treatment apparatus includes a substrate transfer mechanism; a defect inspection section; means for controlling transfer of a substrate; means for classifying a defect based on the state of the defect; means for storing a transfer route of the substrate by the substrate transfer mechanism when the substrate has been treated by treatment sections; and means for specifying, based on a kind of the defect classified by the defect classification means and the transfer route of the substrate stored in the storage means, a treatment section which is a cause of occurrence of the classified defect, and judging presence or absence of an abnormality of the specified treatment section, wherein the transfer control means controls the substrate transfer mechanism to transfer a substrate bypassing the treatment section which has been judged to be abnormal by the defective treatment specification means.