发明申请
US20120121858A1 HYDROPHOBIC FILM, PATTERNED FILM HAVING HYDROPHOBIC AND HYDROPHILIC REGIONS, AND METHOD FOR PRODUCING THE SAME
审中-公开
疏水膜，具有疏水性和疏水性区域的图案膜及其制造方法
- 专利标题： HYDROPHOBIC FILM, PATTERNED FILM HAVING HYDROPHOBIC AND HYDROPHILIC REGIONS, AND METHOD FOR PRODUCING THE SAME
- 专利标题（中）： 疏水膜，具有疏水性和疏水性区域的图案膜及其制造方法
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申请号： US13321656申请日： 2010-05-24
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公开(公告)号： US20120121858A1公开(公告)日： 2012-05-17
- 发明人: Shinji Kato
- 申请人： Shinji Kato
- 申请人地址： JP Sakura-shi JP Tokyo
- 专利权人： Kawamura Institue of Chemical Research,DIC Corporation
- 当前专利权人： Kawamura Institue of Chemical Research,DIC Corporation
- 当前专利权人地址： JP Sakura-shi JP Tokyo
- 优先权： JP2009-125247 20090525; JP2009-125248 20090525; JP2010-004864 20100113
- 国际申请： PCT/JP2010/058708 WO 20100524
- 主分类号： C08J3/28
- IPC分类号： C08J3/28 ; C08F22/10 ; B05D3/06 ; C08F120/36 ; C08F22/20 ; B32B3/10
摘要：
The present invention relates to a method for producing a superhydrophobic film composed of a polymer having surface microstructures (irregularities) and in particular to a method for producing a superhydrophobic film that utilizes a phase separation phenomenon caused by a polymerization reaction by energy ray irradiation and to a superhydrophobic film formed by this production method. The method includes a step of preparing a film-forming composition (X) by mixing a polymerizable compound (A) that can be polymerized by energy ray irradiation and a compound (B) that is compatible with the polymerizable compound (A) but incompatible with a polymer of the polymerizable compound (A), a step of forming a layer of the film-forming composition (X); and a step of removing the compound (B) after polymerizing the polymerizable compound (A), in which the compound (B) is liquid or solid, has a molecular weight of 500 or less, and has a saturation vapor pressure of 400 Pa or less at 25° C.
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