Invention Application
US20120128938A1 ETCHING METHOD FOR SURFACE STRUCTURING 有权
表面结构的蚀刻方法

ETCHING METHOD FOR SURFACE STRUCTURING
Abstract:
An etching method for selective introduction of structures into surfaces of different substrates, such as glass or glass ceramic substrates, is provided. The method provides for surface structuring using an etch mask. The etchmask allows for the production of very fine structures on the substrate surfaces using liquid etching media. In this method the etch mask is produced on the substrate.
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