Invention Application
- Patent Title: ETCHING METHOD FOR SURFACE STRUCTURING
- Patent Title (中): 表面结构的蚀刻方法
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Application No.: US13299544Application Date: 2011-11-18
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Publication No.: US20120128938A1Publication Date: 2012-05-24
- Inventor: Eveline Rudigier-Voigt , Matthias Bockmeyer
- Applicant: Eveline Rudigier-Voigt , Matthias Bockmeyer
- Applicant Address: DE Mainz
- Assignee: SCHOTT AG
- Current Assignee: SCHOTT AG
- Current Assignee Address: DE Mainz
- Priority: DE102010044133.3 20101118
- Main IPC: B32B3/30
- IPC: B32B3/30 ; B05D3/00 ; B44C1/22 ; B05D5/00 ; B82Y99/00

Abstract:
An etching method for selective introduction of structures into surfaces of different substrates, such as glass or glass ceramic substrates, is provided. The method provides for surface structuring using an etch mask. The etchmask allows for the production of very fine structures on the substrate surfaces using liquid etching media. In this method the etch mask is produced on the substrate.
Public/Granted literature
- US09340450B2 Etching method for surface structuring Public/Granted day:2016-05-17
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