Invention Application
- Patent Title: SILICON PHOTOMULTIPLIER AND METHOD FOR FABRICATING THE SAME
- Patent Title (中): 硅光电子照相机及其制造方法
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Application No.: US13289256Application Date: 2011-11-04
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Publication No.: US20120139071A1Publication Date: 2012-06-07
- Inventor: Joon Sung LEE , Yong Sun YOON
- Applicant: Joon Sung LEE , Yong Sun YOON
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Priority: KR10-2010-0124443 20101207
- Main IPC: H01L31/0224
- IPC: H01L31/0224

Abstract:
Provided are a silicon photomultiplier and method for fabricating silicon photomultiplier. The silicon photomultiplier includes a first conductive type semiconductor layer; a first conductive type buried layer disposed in a lower portion of the first conductive type semiconductor layer, and having a higher impurity concentration than the first conductive type semiconductor layer; quench resistors spaced from each other and disposed on the first conductive type semiconductor layer; a transparent insulator formed on the first conductive type semiconductor layer, and exposing the quench resistors; second conductive type doped layers disposed under the quench resistors to contact the first conductive type semiconductor layer; and a transparent electrode commonly connected to the quench resistors electrically.
Public/Granted literature
- US08482092B2 Silicon photomultiplier and method for fabricating the same Public/Granted day:2013-07-09
Information query
IPC分类: