Invention Application
- Patent Title: OPTICAL ELEMENT AND LITHOGRAPHIC APPARATUS
- Patent Title (中): 光学元件和光刻设备
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Application No.: US13372093Application Date: 2012-02-13
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Publication No.: US20120140197A1Publication Date: 2012-06-07
- Inventor: Levinus Pieter BAKKER
- Applicant: Levinus Pieter BAKKER
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B. V.
- Current Assignee: ASML Netherlands B. V.
- Current Assignee Address: NL Veldhoven
- Priority: EP03077850.0 20030910
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G02B5/18

Abstract:
An optical element includes a surface including a tilted profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, and a transmissive layer that covers the cavities and the elevations of the optical element. A first height of the transmissive layer in the cavities is substantially equal or larger than the predetermined maximum height difference and the transmissive layer has a second height on the elevations and the second height is about 10-500 nm. The transmissive layer is enabled to optically filter incident radiation, and the optical element is a grating.
Public/Granted literature
- US09097993B2 Optical element and lithographic apparatus Public/Granted day:2015-08-04
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