发明申请
- 专利标题： Pattern Shape Estimation Method and Pattern Measuring Device
- 专利标题（中）： 图案形状估计方法和图案测量装置
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申请号： US13390354申请日： 2010-07-15
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公开(公告)号： US20120151428A1公开(公告)日： 2012-06-14
- 发明人: Maki Tanaka , Norio Hasegawa , Chie Shishido , Mayuka Osaki
- 申请人： Maki Tanaka , Norio Hasegawa , Chie Shishido , Mayuka Osaki
- 申请人地址： JP Minato-ku, Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Minato-ku, Tokyo
- 优先权： JP2009-191567 20090821
- 国际申请： PCT/JP2010/004589 WO 20100715
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
The present invention aims at proposing a library creation method and a pattern shape estimation method in which it is possible, when estimating a shape based on comparison between an actual waveform and a library, to appropriately estimate the shape.As an illustrative embodiment to achieve the object, there are proposed a method of selecting a pattern by referring to a library, a method of creating a library by use of pattern cross-sectional shapes calculated through an exposure process simulation in advance, and a method for selecting a pattern shape stored in the library.
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