发明申请
US20120161068A1 METHOD FOR INHIBITING THE FORMATION AND DEPOSITION OF SILICA SCALE IN AQUEOUS SYSTEMS
有权
抑制水质系统中二氧化硅浓度的形成和沉积的方法
- 专利标题: METHOD FOR INHIBITING THE FORMATION AND DEPOSITION OF SILICA SCALE IN AQUEOUS SYSTEMS
- 专利标题(中): 抑制水质系统中二氧化硅浓度的形成和沉积的方法
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申请号: US12976013申请日: 2010-12-22
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公开(公告)号: US20120161068A1公开(公告)日: 2012-06-28
- 发明人: Nathaniel T. Greene , Jasbir S. Gill , Martin R. Godfrey , Cheryl Williams
- 申请人: Nathaniel T. Greene , Jasbir S. Gill , Martin R. Godfrey , Cheryl Williams
- 主分类号: C02F5/10
- IPC分类号: C02F5/10 ; C02F5/04
摘要:
This invention relates to an improved method for inhibiting the formation and deposition of silica and silicate compounds in a water system. In particular, the method includes adding to the water system a relatively low molecular weight organic, anionic polymer. The polymer preferrably has an acrylic acid or methacrylic acid functionality and is preferrably selected from one or more of homopolymers of acrylic acid, a methacrylic acid/polyethylene glycol allyl ether copolymer, a homopolymer of methacrylic acid, an acrylic acid/polyethylene glycol allyl ether copolymer, and an acrylic acid/1-allyloxy-2-hydroxypropane sulfonic acid copolymer, homopolymers of maleic anhydride, copolymers of maleic anhydride and polyethylene glycol allyl ether, and combinations thereof.
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