Invention Application
- Patent Title: INTERLEAVED CONDUCTOR STRUCTURE WITH WRAP AROUND TRACES
- Patent Title (中): 带缠绕线的交流导体结构
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Application No.: US12976899Application Date: 2010-12-22
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Publication No.: US20120162825A1Publication Date: 2012-06-28
- Inventor: JOHN T. CONTRERAS , Nobumasa Nishiyama , Edgar D. Rothenberg , Rehan A. Zakai , Yiduo Zhang
- Applicant: JOHN T. CONTRERAS , Nobumasa Nishiyama , Edgar D. Rothenberg , Rehan A. Zakai , Yiduo Zhang
- Main IPC: G11B5/48
- IPC: G11B5/48

Abstract:
An interleaved conductor structure for electrically connecting the read/write electronics to a read/write head in a hard disk drive is provided. The interleaved conductor structure may allow for an increased characteristic-impedance range, greater interference shielding and a reduction of signal loss that is contributed by a lossy conductive substrate. The electrical traces may have different widths, be offset, or even wrap around each other at the via connections.
Public/Granted literature
- US08675311B2 Interleaved conductor structure with wrap around traces Public/Granted day:2014-03-18
Information query
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