发明申请
- 专利标题： METHOD AND DEVICE FOR FORMING PATTERN
- 专利标题（中）： 用于形成图案的方法和装置
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申请号： US13230591申请日： 2011-09-12
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公开(公告)号： US20120164346A1公开(公告)日： 2012-06-28
- 发明人: Ikuo Yoneda , Tetsuro Nakasugi
- 申请人： Ikuo Yoneda , Tetsuro Nakasugi
- 优先权： JP2010-285727 20101222
- 主分类号： B05D3/06
- IPC分类号： B05D3/06 ; B05B5/16
摘要：
According to a method for forming a pattern in one embodiment, a first pattern is formed on a substrate, and an upper part of the first pattern is irradiated with ultraviolet rays, to enhance a liquid-repellent property to an inversion resin material. Furthermore, according to the method for forming the pattern, the inversion resin material is applied to the substrate after the irradiation of the ultraviolet rays, the first pattern is removed after the inversion resin material has been applied to form a second pattern containing the inversion resin material, and the substrate is processed using the second pattern as a mask.
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