发明申请
- 专利标题： Thin-Layer Element Having an Interference Layer Structure
- 专利标题（中）： 具有干涉层结构的薄层元件
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申请号： US13395333申请日： 2010-09-10
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公开(公告)号： US20120170124A1公开(公告)日： 2012-07-05
- 发明人: Christian Fuhse , Michael Rahm , Manfred Heim , Ralf Liebler
- 申请人： Christian Fuhse , Michael Rahm , Manfred Heim , Ralf Liebler
- 申请人地址： DE Munich
- 专利权人： GIESECKE & DEVRIENT GMBH
- 当前专利权人： GIESECKE & DEVRIENT GMBH
- 当前专利权人地址： DE Munich
- 优先权： DE102009041583.1 20090915
- 国际申请： PCT/EP2010/005563 WO 20100910
- 主分类号： G02B5/28
- IPC分类号： G02B5/28 ; B44F1/12 ; G02B1/10
摘要：
The present invention relates to a thin-film element (30) having an interference layer structure for security papers, value documents and the like, having at least two semitransparent absorber layers (34, 38) and at least one dielectric spacing layer (36) arranged between the at least two absorber layers. According to the present invention, it is provided that the two absorber layers (34, 38) are each formed from a material having a complex refractive index N whose real part n and imaginary part k differ at least in a portion of the visible spectral range by a factor of 5 or more.
公开/授权文献
- US09274258B2 Thin-layer element having an interference layer structure 公开/授权日：2016-03-01
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