Invention Application
US20120174865A1 DEPOSITION SOURCE AND ORGANIC LAYER DEPOSITION APPARATUS INCLUDING THE SAME
审中-公开
沉积源和有机层沉积装置,包括它们
- Patent Title: DEPOSITION SOURCE AND ORGANIC LAYER DEPOSITION APPARATUS INCLUDING THE SAME
- Patent Title (中): 沉积源和有机层沉积装置,包括它们
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Application No.: US13328524Application Date: 2011-12-16
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Publication No.: US20120174865A1Publication Date: 2012-07-12
- Inventor: Young-Mook CHOI , Hee-Cheol Kang , Chae-Woong Kim , Mu-Hyun Kim , Dong-Kyu Lee
- Applicant: Young-Mook CHOI , Hee-Cheol Kang , Chae-Woong Kim , Mu-Hyun Kim , Dong-Kyu Lee
- Priority: KR10-2011-0003155 20110112
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/04

Abstract:
A deposition source and an organic layer deposition apparatus that may be simply applied to the manufacture of large-sized display apparatuses on a mass scale and may prevent or substantially prevent deposition source nozzles from being blocked during deposition of a deposition material, thereby improving manufacturing yield and deposition efficiency. A deposition source includes a first deposition source including a plurality of first deposition source nozzles, and a second deposition source including a plurality of second deposition source nozzles wherein the plurality of first deposition source nozzles and the plurality of second deposition source nozzles are tilted toward each other.
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