Provided are a semiconductor package and a method of manufacturing the same. a substrate including a first face and a second face, wherein the first and second faces face each other; a first ground pattern disposed on the first face; a second ground pattern disposed on the second face; a plurality of ground via plugs which connect the first ground pattern and the second ground pattern, wherein the plurality of ground via plugs penetrate the substrate; and a first aluminum oxide film interposed between the plurality of ground via plugs, wherein a ground voltage is applied to the plurality of ground via plugs. The semiconductor package may be manufactured using an anodic oxidation process.