发明申请
US20120185211A1 PARTICLE MEASURING APPARATUS AND MEASURING METHOD USING THE SAME
有权
颗粒测量装置和使用该方法的测量方法
- 专利标题: PARTICLE MEASURING APPARATUS AND MEASURING METHOD USING THE SAME
- 专利标题(中): 颗粒测量装置和使用该方法的测量方法
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申请号: US13337369申请日: 2011-12-27
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公开(公告)号: US20120185211A1公开(公告)日: 2012-07-19
- 发明人: Yong Koo LEE , In Duk HWANG , Tae Soo KIM , Jong Gun LEE , Seock Woo JANG , Chul Ho YUN
- 申请人: Yong Koo LEE , In Duk HWANG , Tae Soo KIM , Jong Gun LEE , Seock Woo JANG , Chul Ho YUN
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2011-0004545 20110117
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
Provided are a particle measurement apparatus having a plurality of apertures arranged in series therein, and a particle measurement method using the same to statistically analyze multiple signals generated when a particle passes through the plurality of apertures, thus acquiring more accurate information on particles. The particle measurement apparatus includes a plurality of aperture members arranged in series, a plurality of electrodes to form an electric field within the plurality of aperture members, and an analyzer for statistically analyzing multiple electrical signals generated when a particle passes through the plurality of aperture members.
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