发明申请
- 专利标题： PROCESS AND APPARATUS FOR CONTROLLING COATING DEPOSITION
- 专利标题（中）： 用于控制涂层沉积的方法和装置
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申请号： US13392237申请日： 2010-09-02
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公开(公告)号： US20120189766A1公开(公告)日： 2012-07-26
- 发明人: Markku Rajala , Juha Tikkanen
- 申请人： Markku Rajala , Juha Tikkanen
- 申请人地址： FI Vantaa
- 专利权人： BENEQ OY
- 当前专利权人： BENEQ OY
- 当前专利权人地址： FI Vantaa
- 优先权： FI20090319 20090903
- 国际申请： PCT/FI10/50685 WO 20100902
- 主分类号： C23C16/52
- IPC分类号： C23C16/52
摘要：
Method and apparatus for controlling a coating deposition process, where at least at one stage of the coating deposition process at least one of the coating precursors includes a gas, a vapour or an aerosol. The method includes monitoring ultrafine particles and adjusting at least one process parameter based on the monitoring. The apparatus includes means for monitoring ultrafine particles and means for adjusting at least one process parameter based on the monitoring.
公开/授权文献
- US08673389B2 Process for controlling coating deposition 公开/授权日：2014-03-18
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