Invention Application
- Patent Title: HOLOGRAM FABRICATION PROCESS AND FABRICATED HOLOGRAM
- Patent Title (中): HOLOGRAM制造工艺和织造的HOLOGRAM
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Application No.: US13425342Application Date: 2012-03-20
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Publication No.: US20120194887A1Publication Date: 2012-08-02
- Inventor: Tsuyoshi YAMAUCHI , Kenji UEDA , Masachika WATANABE
- Applicant: Tsuyoshi YAMAUCHI , Kenji UEDA , Masachika WATANABE
- Applicant Address: JP Tokyo
- Assignee: DAI NIPPON PRINTING CO., LTD.
- Current Assignee: DAI NIPPON PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2008-022751 20080201; JP2009-009471 20090120
- Main IPC: G02B5/32
- IPC: G02B5/32
Abstract:
A volume hologram recording material is located on the side of a reflection type volume hologram master onto which copying illumination light is incident, and the copying illumination light incident onto the recording material and light diffracted through the master interfere together in the volume hologram recording material thereby copying the reflection type volume hologram master. In this case, a reflecting plate having a fine regular reflection pattern is interleaved between the master and the recording material, and the copying illumination light incident onto the recording material and regularly reflected light from the reflecting plate having the regular reflection pattern interfere together in the recording material thereby allowing the regular reflection pattern to be multi-recorded in a hologram having the reflection type volume hologram master copied in it.
Public/Granted literature
- US08642231B2 Hologram fabrication process and fabricated hologram Public/Granted day:2014-02-04
Information query
