发明申请
- 专利标题： NON-HALOGENATED ETCHANT AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE NON-HALOGENATED ETCHANT
- 专利标题（中）： 非对位蚀刻剂和使用非底物蚀刻剂制造显示基板的方法
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申请号： US13330657申请日： 2011-12-19
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公开(公告)号： US20120208310A1公开(公告)日： 2012-08-16
- 发明人: Seon-Il KIM , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun JIN
- 申请人： Seon-Il KIM , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun JIN
- 申请人地址： KR Seoul KR Suwon-si
- 专利权人： DONGWOO FINE-CHEM CO., LTD.,SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人： DONGWOO FINE-CHEM CO., LTD.,SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址： KR Seoul KR Suwon-si
- 优先权： KR10-2011-0013098 20110215
- 主分类号： H01L33/08
- IPC分类号： H01L33/08
摘要：
Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.