发明申请
US20120210278A1 SYSTEMS, METHODS AND COMPUTER PROGRAM PRODUCTS FOR FORMING PHOTOMASKS WITH REDUCED LIKELIHOOD OF FEATURE COLLAPSE, AND PHOTOMASKS SO FORMED
有权
系统，方法和计算机程序产品，用于形成具有减少特征褶皱的光子，并形成光电子
- 专利标题： SYSTEMS, METHODS AND COMPUTER PROGRAM PRODUCTS FOR FORMING PHOTOMASKS WITH REDUCED LIKELIHOOD OF FEATURE COLLAPSE, AND PHOTOMASKS SO FORMED
- 专利标题（中）： 系统，方法和计算机程序产品，用于形成具有减少特征褶皱的光子，并形成光电子
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申请号： US13281787申请日： 2011-10-26
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公开(公告)号： US20120210278A1公开(公告)日： 2012-08-16
- 发明人: Mi-kyeong Lee , Seong-woon Choi
- 申请人： Mi-kyeong Lee , Seong-woon Choi
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 优先权： KR10-2011-0011926 20110210
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
At least one pattern of a photomask is identified that has a likelihood of causing collapse of a microelectronic device feature that is formed using the photomask, due to surface tension of a solution that is applied to the feature during manufacture of the microelectronic device. The patterns of the photomask are then modified to reduce the likelihood of the collapse. The photomask may be formed and the photomask may be used to manufacture microelectronic devices. Related methods, systems, devices and computer program products are described.
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