发明申请
- 专利标题: Charged Particle Beam Device, Position Specification Method Used for Charged Particle Beam Device, and Program
- 专利标题(中): 带电粒子束装置,用于带电粒子束装置的位置规范方法和程序
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申请号: US13503074申请日: 2010-10-06
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公开(公告)号: US20120211652A1公开(公告)日: 2012-08-23
- 发明人: Kunio Sakamoto , Megumi Aizawa , Satoshi Tomimatsu , Isamu Sekihara
- 申请人: Kunio Sakamoto , Megumi Aizawa , Satoshi Tomimatsu , Isamu Sekihara
- 优先权: JP2009-244537 20091023
- 国际申请: PCT/JP2010/067531 WO 20101006
- 主分类号: H01J37/26
- IPC分类号: H01J37/26
摘要:
Observation using an FIB image is enabled without causing any damage to a designated region. To this end, an ion beam scanning-prohibited region is set in a sample by using an image acquired by a charged particle beam other than an ion beam, or an image prepared as external data as a peripheral image including the designated region of a sample. Thereafter, the image used to set the ion beam scanning-prohibited region is exactly superimposed on an FIB image acquired for regions except the ion beam scanning-prohibited region, thereby forming an image including the ion beam scanning-prohibited region on which ion beam scanning has not been performed.
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