发明申请
- 专利标题： Method of Pattern Selection for Source and Mask Optimization
- 专利标题（中）： 源和掩码优化的模式选择方法
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申请号： US13505286申请日： 2010-10-26
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公开(公告)号： US20120216156A1公开(公告)日： 2012-08-23
- 发明人: Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
- 申请人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
- 申请人地址： NL DR Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL DR Veldhoven
- 国际申请： PCT/EP2010/066106 WO 20101026
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.