发明申请
- 专利标题： METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND METHOD OF IMPROVING A MATHEMATICAL MODEL OF A LITHOGRAPHIC PROCESS
- 专利标题（中）： 控制图形设备的方法，设备制造方法，平面设备，计算机程序产品和改进算术过程的数学模型的方法
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申请号： US13416387申请日： 2012-03-09
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公开(公告)号： US20120229786A1公开(公告)日： 2012-09-13
- 发明人: Adrianus Franciscus Petrus ENGELEN , Henricus Johannes Lambertus MEGENS , Johannes Catharinus Hubertus MULKENS , Robert KAZINCZI , Jen-Shiang WANG
- 申请人： Adrianus Franciscus Petrus ENGELEN , Henricus Johannes Lambertus MEGENS , Johannes Catharinus Hubertus MULKENS , Robert KAZINCZI , Jen-Shiang WANG
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/54
- IPC分类号： G03B27/54
摘要：
A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.
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