发明申请
- 专利标题: DROPLET-DISCHARGING-HEAD MANUFACTURING APPARATUS, DROPLET-DISCHARGING-HEAD MANUFACUTRING METHOD, DROPLET DISCHARGING HEAD, DROPLET DISCHARGING DEVICE, AND PRINTING APPARATUS
- 专利标题(中): 喷水头脱水头制造设备,脱墨放置头制造方法,喷射头卸料头,喷射器排出装置和印刷装置
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申请号: US13419800申请日: 2012-03-14
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公开(公告)号: US20120236067A1公开(公告)日: 2012-09-20
- 发明人: Yukitoshi TAJIMA , Keiji Ueda
- 申请人: Yukitoshi TAJIMA , Keiji Ueda
- 申请人地址: JP Tokyo
- 专利权人: RICOH COMPANY, LTD.
- 当前专利权人: RICOH COMPANY, LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2011-057143 20110315
- 主分类号: B41J2/015
- IPC分类号: B41J2/015 ; B05C5/02 ; B05C11/00 ; H01L21/30
摘要:
A droplet-discharging-head manufacturing apparatus that manufactures a droplet discharging head that includes a piezoelectric element formed by a laminated body of ferroelectric layers includes: a film forming unit that forms a ferroelectric precursor film on a silicon wafer having a conductive layer; a heating layer that heats and bakes the ferroelectric precursor layer to form the ferroelectric layer; a cooling unit that cools the ferroelectric layer; a conveying unit that conveys the silicon wafers one by one; and a control unit that controls the film forming unit, the heating unit, the cooling unit, and the conveying unit so as to repeat a series of processes including formation of the ferroelectric precursor layers by the film forming unit, heating of the ferroelectric precursor layers by the heating unit, and cooling of the ferroelectric layers by the cooling unit, for a predetermined number of times for each of the silicon wafers.
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