发明申请
- 专利标题: Resistive-Switching Memory and Fabrication Method Thereof
- 专利标题(中): 电阻式开关存储器及其制作方法
-
申请号: US13254570申请日: 2011-04-12
-
公开(公告)号: US20120241712A1公开(公告)日: 2012-09-27
- 发明人: Yimao Cai , Ru Huang , Yangyuan Wang , Yinglong Huang
- 申请人: Yimao Cai , Ru Huang , Yangyuan Wang , Yinglong Huang
- 优先权: CN201110070280.X 20110323
- 国际申请: PCT/CN11/72639 WO 20110412
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L21/62
摘要:
The present invention discloses a resistive-switching memory and the fabrication method thereof. The resistive-switching memory comprises a substrate, a top electrode, a bottom electrode, and a resistive-switching material interposed between the top and bottom electrodes, wherein the central portion of the bottom electrode protrudes upwards to form a peak shape, and the top electrode is in a plate shape. The peak structure of the bottom electrode reduces power consumption of the device. The fabrication method thereof comprises forming peak structures on the surface of the substrate by means of corrosion, and then growing bottom electrodes thereon to form bottom electrodes having peak shapes, and depositing resistive-switching material and top electrodes. The entire fabrication process is simple, and high integration degree of the device can be achieved.
公开/授权文献
- US08513639B2 Resistive-switching memory and fabrication method thereof 公开/授权日:2013-08-20
信息查询
IPC分类: