Invention Application
US20120251714A1 FINE GRAINED, NON BANDED, REFRACTORY METAL SPUTTERING TARGETS WITH A UNIFORMLY RANDOM CRYSTALLOGRAPHIC ORIENTATION, METHOD FOR MAKING SUCH FILM, AND THIN FILM BASED DEVICES AND PRODUCTS MADE THEREFROM
有权
精细粒度，非带状，具有均匀的随机晶体取向的耐火金属溅射靶，制造这种膜的方法以及薄膜的器件及其制造的产品
- Patent Title: FINE GRAINED, NON BANDED, REFRACTORY METAL SPUTTERING TARGETS WITH A UNIFORMLY RANDOM CRYSTALLOGRAPHIC ORIENTATION, METHOD FOR MAKING SUCH FILM, AND THIN FILM BASED DEVICES AND PRODUCTS MADE THEREFROM
- Patent Title (中): 精细粒度，非带状，具有均匀的随机晶体取向的耐火金属溅射靶，制造这种膜的方法以及薄膜的器件及其制造的产品
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Application No.: US13465475Application Date: 2012-05-07
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Publication No.: US20120251714A1Publication Date: 2012-10-04
- Inventor: Steven A. Miller , Olaf Schmidt-Park , Prabhat Kumar , Richard Wu , Shuwei Sun , Stefan Zimmermann
- Applicant: Steven A. Miller , Olaf Schmidt-Park , Prabhat Kumar , Richard Wu , Shuwei Sun , Stefan Zimmermann
- Main IPC: B05D7/00
- IPC: B05D7/00 ; B05D3/12 ; B05D3/02
Abstract:
In various embodiments, sputtering targets are refurbished by spray-depositing a powder within a furrow in the sputtering target to form a layer therein.
Public/Granted literature
- US08491959B2 Methods of rejuvenating sputtering targets Public/Granted day:2013-07-23
Information query
