发明申请
- 专利标题: SURFACE-EMISSION LASER DIODE AND FABRICATION PROCESS THEREOF
- 专利标题(中): 表面发射激光二极管及其制造工艺
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申请号: US13459333申请日: 2012-04-30
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公开(公告)号: US20120263206A1公开(公告)日: 2012-10-18
- 发明人: Shunichi SATO , Akihiro Itoh , Naoto Jikutani
- 申请人: Shunichi SATO , Akihiro Itoh , Naoto Jikutani
- 申请人地址: JP TOKYO
- 专利权人: RICOH COMPANY, LTD
- 当前专利权人: RICOH COMPANY, LTD
- 当前专利权人地址: JP TOKYO
- 优先权: JP2004-173890 20040611; JP2004-359671 20041213; JP2005-088188 20050325; JP2005-101765 20050331
- 主分类号: H01S5/34
- IPC分类号: H01S5/34 ; H04B10/04 ; G03G15/04
摘要:
A surface-emission laser diode includes a GaAs substrate, a cavity region, and upper and lower reflectors provided at a top part and a bottom part of the cavity region, the upper reflector and/or the lower reflector including a semiconductor Bragg reflector, at least a part of the semiconductor distributed Bragg reflector includes a semiconductor layer containing Al, Ga and As as major components, there being provided, between the active layer and the semiconductor layer that contains Al, Ga and As as major components, a semiconductor layer containing Al, In and P as major components adjacent to the semiconductor layer that contains Al, Ga and As as major components, with an interface formed coincident to a location of a node of electric strength distribution.
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