发明申请
- 专利标题: Plasma Sterilization Apparatus
- 专利标题(中): 等离子灭菌装置
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申请号: US13441026申请日: 2012-04-06
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公开(公告)号: US20120263628A1公开(公告)日: 2012-10-18
- 发明人: Takumi TANDOU , Nobuyuki Negishi , Hiroyuki Kobayashi , Keizo Suzuki
- 申请人: Takumi TANDOU , Nobuyuki Negishi , Hiroyuki Kobayashi , Keizo Suzuki
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2011-089366 20110413
- 主分类号: A61L9/015
- IPC分类号: A61L9/015
摘要:
In order to provide a plasma sterilization apparatus with high plasma generation efficiency, the apparatus includes first and second electrodes (3, 2), a first dielectric body layer (1), and an insulating spacer (6). The first dielectric body layer (1) is disposed between the first and second electrodes (3, 2). The insulating spacer (6) is disposed between the first electrode (3) and the first dielectric body layer (1). The insulating spacer (6) has a lower permittivity than a permittivity of the first dielectric body layer (1).
公开/授权文献
- US08747763B2 Plasma sterilization apparatus 公开/授权日:2014-06-10
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