发明申请
- 专利标题: PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN VARNISH, PHOTOSENSITIVE RESIN FILM, AND PHOTOSENSITIVE RESIN CURED PRODUCT
- 专利标题(中): 感光树脂组合物,感光树脂变性,感光树脂薄膜和感光树脂固化产品
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申请号: US13512713申请日: 2010-11-29
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公开(公告)号: US20120270963A1公开(公告)日: 2012-10-25
- 发明人: Kouji Suzumura , Ikue Mitani , Toshihiko Takasaki , Ikuo Mukai , Masami Ochiai
- 申请人: Kouji Suzumura , Ikue Mitani , Toshihiko Takasaki , Ikuo Mukai , Masami Ochiai
- 优先权: JP2009272814 20091130
- 国际申请: PCT/JP2010/071295 WO 20101129
- 主分类号: C08L33/14
- IPC分类号: C08L33/14
摘要:
Provided are a photosensitive resin composition capable of being quickly cured by light and providing an optically cured product which is excellent in a transparency in a visible light of 400 to 780 nm and a heat resistant reliability, a photosensitive resin varnish, a photosensitive resin film and a photosensitive resin cured product.The photosensitive resin composition comprises (A) a polymerizable compound, (B) a polymerization initiator and (C) a hindered phenol base antioxidant, wherein (B-1) at least one selected from α-hydroxyacetophenone base photoinitiator and a glyoxy ester base photoinitiator and (B-2) a phosphine oxide base photoinitiator are contained as the component (B); the component (C) is a hindered phenol base antioxidant having in a molecule, at least one phenol group having each one group of a methyl group and a t-butyl group on the same aromatic ring; a content of the component (B) is 0.02 to 4.0 parts by mass based on 100 parts by mass of the component (A); and a content of the component (C) is 0.01 to 1 part by mass based on 100 parts by mass of the component (A).
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