发明申请
US20120279657A1 RF Coupled Plasma Abatement System Comprising an Integrated Power Oscillator
有权
RF耦合等离子体消除系统,包括集成功率振荡器
- 专利标题: RF Coupled Plasma Abatement System Comprising an Integrated Power Oscillator
- 专利标题(中): RF耦合等离子体消除系统,包括集成功率振荡器
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申请号: US13102206申请日: 2011-05-06
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公开(公告)号: US20120279657A1公开(公告)日: 2012-11-08
- 发明人: Aseem K. Srivastava , William F. DiVergilio
- 申请人: Aseem K. Srivastava , William F. DiVergilio
- 申请人地址: US MA Beverly
- 专利权人: Axcelis Technologies, Inc.
- 当前专利权人: Axcelis Technologies, Inc.
- 当前专利权人地址: US MA Beverly
- 主分类号: H01L21/306
- IPC分类号: H01L21/306
摘要:
The present disclosure is directed towards a method and apparatus for generating an abatement plasma downstream of a processing chamber using an RF plasma ignited and sustained with an integrated power oscillator circuit driven by feedback based upon a load of the abatement plasma. In one embodiment, a plasma ashing system includes an abatement system configured to receive an effluent byproduct from an upstream processing chamber containing a workpiece. The effluent byproduct is provided along an exhaust conduit to a downstream afterburner unit having an integrated power oscillator, that relies upon an oscillating circuit operatively coupled to an antenna to ignite the abatement plasma within the exhaust conduit. The antenna, together with the plasma load, form a resonant tank circuit, which provides a feedback that drives operation of the oscillating circuit, thereby allowing the oscillating circuit to vary its output based upon changes in the abatement plasma load.