发明申请
- 专利标题: Thin Substrate Fabrication Using Stress-Induced Spalling
- 专利标题(中): 使用应力诱发剥落的薄基板制造
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申请号: US13480329申请日: 2012-05-24
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公开(公告)号: US20120282782A1公开(公告)日: 2012-11-08
- 发明人: Stephen W. Bedell , Keith E. Fogel , Paul A. Lauro , Devendra Sadana
- 申请人: Stephen W. Bedell , Keith E. Fogel , Paul A. Lauro , Devendra Sadana
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L21/30
- IPC分类号: H01L21/30
摘要:
Manufacturing a thin film direct bandgap semiconductor active solar cell device comprises providing a source substrate having a surface and disposing on the surface a stress layer having a stress layer surface area in contact with and bonded to the surface of the source substrate. Operatively associating a handle foil with the stress layer and applying force to the handle foil separates the stress layer from the source substrate, and leaves a portion of the source substrate on the stress layer surface substantially corresponding to the area in contact with the surface of the source substrate. The portion is less thick than the source layer. The stress layer thickness is below that which results in spontaneous spalling of the source substrate. The source substrate may comprise an inorganic single crystal or polycrystalline material such as Si, Ge, GaAs, SiC, sapphire, or GaN. The stress layer may comprise a flexible material.
公开/授权文献
- US08450184B2 Thin substrate fabrication using stress-induced spalling 公开/授权日:2013-05-28