发明申请
US20120288797A1 PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION LITHOGRAPHY
审中-公开
光电组合物及其在高折射刻蚀中的应用方法
- 专利标题： PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION LITHOGRAPHY
- 专利标题（中）： 光电组合物及其在高折射刻蚀中的应用方法
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申请号： US13543852申请日： 2012-07-08
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公开(公告)号： US20120288797A1公开(公告)日： 2012-11-15
- 发明人: Hiroshi Ito , Daniel Paul Sanders , Linda Sundberg
- 申请人： Hiroshi Ito , Daniel Paul Sanders , Linda Sundberg
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/075
摘要：
The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.