发明申请
- 专利标题: ELECTRO CHEMICAL DEPOSITION AND REPLENISHMENT APPARATUS
- 专利标题(中): 电化学沉积和补充装置
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申请号: US13445217申请日: 2012-04-12
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公开(公告)号: US20120298502A1公开(公告)日: 2012-11-29
- 发明人: Demetrius Papapanayiotou , Arthur Keigler , David Guarnaccia , Jonathan Hander , Johannes Chiu
- 申请人: Demetrius Papapanayiotou , Arthur Keigler , David Guarnaccia , Jonathan Hander , Johannes Chiu
- 主分类号: C25B15/08
- IPC分类号: C25B15/08
摘要:
A process electrolyte replenishment module adapted to replenish ions in a process electrolyte in a substrate electrochemical deposition apparatus having a first anode and a first cathode, the replenishment module having a second anode. A process electrolyte recirculation compartment is disposed in the frame configured so that the process electrolyte is recirculating between the replenishment module and the deposition apparatus. An anode compartment is coupled to the process electrolyte recirculation compartment having the second anode, that is a soluble anode, for immersion in a secondary anolyte, and having a first ion exchange membrane being a cationic member separating the secondary anolyte from the process electrolyte. A cathode compartment is provided in the frame coupled to the process electrolyte recirculation compartment having a second cathode for immersion in a secondary catholyte, and having a second ion exchange membrane being a monovalent selective membrane separating the secondary catholyte from the process electrolyte.
公开/授权文献
- US09017528B2 Electro chemical deposition and replenishment apparatus 公开/授权日:2015-04-28
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