发明申请
US20120299610A1 METHOD AND APPARATUS FOR TESTING A SEMICONDUCTOR WAFER 有权
用于测试半导体波形的方法和装置

  • 专利标题: METHOD AND APPARATUS FOR TESTING A SEMICONDUCTOR WAFER
  • 专利标题(中): 用于测试半导体波形的方法和装置
  • 申请号: US13145109
    申请日: 2009-11-26
  • 公开(公告)号: US20120299610A1
    公开(公告)日: 2012-11-29
  • 发明人: Florian Bieck
  • 申请人: Florian Bieck
  • 申请人地址: SG Singapore
  • 专利权人: DOUBLECHECK SEMICONDUCTORS PTE. LTD.
  • 当前专利权人: DOUBLECHECK SEMICONDUCTORS PTE. LTD.
  • 当前专利权人地址: SG Singapore
  • 优先权: IBPCT/IB2009/050166 20090117; IBPCT/IB2009/050231 20090122; IBPCT/IB2009/052163 20090523; SG200903640-1 20090528; SG200904721-8 20090710; SG200906937-8 20091016
  • 国际申请: PCT/IB2009/055351 WO 20091126
  • 主分类号: G01R31/00
  • IPC分类号: G01R31/00
METHOD AND APPARATUS FOR TESTING A SEMICONDUCTOR WAFER
摘要:
A method for testing a semiconductor wafer comprises providing a semiconductor wafer. The semiconductor wafer comprises a protruding annular rim, a first redistribution structure disposed on the front side of the semiconductor wafer, a second redistribution structure disposed on the rear side of the semiconductor wafer within the protruding annular rim and a plurality of vias extending from the front side to the rear side. A first probe is contacted to the first redistribution structure on the front side and a second probe is contacted to the second redistribution structure on the rear side. The first probe is in contact with the first redistribution structure and the second probe is in contact with the second redistribution structure at the same time.
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