- 专利标题： EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
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申请号： US13572248申请日： 2012-08-10
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公开(公告)号： US20120305811A1公开(公告)日： 2012-12-06
- 发明人: Osamu WAKABAYASHI , Tatsuya YANAGIDA , Hakazu MIZOGUCHI
- 申请人： Osamu WAKABAYASHI , Tatsuya YANAGIDA , Hakazu MIZOGUCHI
- 优先权： JP2010-074256 20100329; JP2010-265791 20101129; JP2011-015695 20110127; JP2011-058026 20110316; JP2011-133112 20110615; JP2011-201750 20110915; JP2012-103580 20120427; JP2012-141079 20120622
- 主分类号： G21K5/00
- IPC分类号： G21K5/00
摘要：
An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
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