Invention Application
- Patent Title: POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAHIC PATTERNS
- Patent Title (中): 聚合物，光电组合物和形成光刻胶图案的方法
-
Application No.: US13309843Application Date: 2011-12-02
-
Publication No.: US20120308927A1Publication Date: 2012-12-06
- Inventor: Young Cheol Bae , David Richard Wilson , Jibin Sun
- Applicant: Young Cheol Bae , David Richard Wilson , Jibin Sun
- Applicant Address: US MI Midland US MA Marlborough
- Assignee: Dow Global Technologies LLC,Rohm and Haas Electronic Materials LLC
- Current Assignee: Dow Global Technologies LLC,Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MI Midland US MA Marlborough
- Main IPC: C08F24/00
- IPC: C08F24/00 ; G03F7/004 ; G03F7/20 ; C08F10/00
Abstract:
Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Public/Granted literature
- US08628911B2 Polymers, photoresist compositions and methods of forming photolithographic patterns Public/Granted day:2014-01-14
Information query
IPC分类:
