Invention Application
- Patent Title: DISABLING ELECTRICAL CONNECTIONS USING PASS-THROUGH 3D INTERCONNECTS AND ASSOCIATED SYSTEMS AND METHODS
- Patent Title (中): 使用通过三维互连和关联系统和方法禁用电气连接
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Application No.: US13572461Application Date: 2012-08-10
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Publication No.: US20120309128A1Publication Date: 2012-12-06
- Inventor: Jeffery W. Janzen , Russell D. Slifer , Michael Chaine , Kyle K. Kirby , William M. Hiatt
- Applicant: Jeffery W. Janzen , Russell D. Slifer , Michael Chaine , Kyle K. Kirby , William M. Hiatt
- Applicant Address: US ID Boise
- Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee Address: US ID Boise
- Main IPC: H01L21/50
- IPC: H01L21/50 ; H01L21/768

Abstract:
Pass-through 3D interconnects and microelectronic dies and systems of stacked dies that include such interconnects to disable electrical connections are disclosed herein. In one embodiment, a system of stacked dies includes a first microelectronic die having a backside, an interconnect extending through the first die to the backside, an integrated circuit electrically coupled to the interconnect, and a first electrostatic discharge (ESD) device electrically isolated from the interconnect. A second microelectronic die has a front side coupled to the backside of the first die, a metal contact at the front side electrically coupled to the interconnect, and a second ESD device electrically coupled to the metal contact. In another embodiment, the first die further includes a substrate carrying the integrated circuit and the first ESD device, and the interconnect is positioned in the substrate to disable an electrical connection between the first ESD device and the interconnect.
Public/Granted literature
- US08404521B2 Disabling electrical connections using pass-through 3D interconnects and associated systems and methods Public/Granted day:2013-03-26
Information query
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