Invention Application
- Patent Title: ISOLATION FOR NANOWIRE DEVICES
- Patent Title (中): 纳米器件的隔离
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Application No.: US13563456Application Date: 2012-07-31
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Publication No.: US20120309173A1Publication Date: 2012-12-06
- Inventor: Uday Shah , Benjamin Chu-Kung , Been-Yih Jin , Ravi Pillarisetty , Marko Radosavljevic , Willy Rachmady
- Applicant: Uday Shah , Benjamin Chu-Kung , Been-Yih Jin , Ravi Pillarisetty , Marko Radosavljevic , Willy Rachmady
- Main IPC: H01L21/20
- IPC: H01L21/20 ; B82Y40/00
Abstract:
The present disclosure relates to the field of fabricating microelectronic devices. In at least one embodiment, the present disclosure relates to forming an isolated nanowire, wherein isolation structure adjacent the nanowire provides a substantially level surface for the formation of microelectronic structures thereon.
Public/Granted literature
- US08883573B2 Isolation for nanowire devices Public/Granted day:2014-11-11
Information query
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